Nanonex Nanoimprintor Family

Nanonex utilizes patented Air Cushion PressTM to ensure maximum nanoimprint unformity. The unique Smart Sample Holder design allows the handling of samples of different sizes and irregular shapes. The full-wafer imprinting scheme enables a high processing throughput.

 

NX-B100/200

NX-B100/200, Full-Wafer Thermal Nanomprintor

Full-wafer nanoimprinting tool
All forms of nanoimprint: photo-curable, thermoplastic & embossing
Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
High throughput due to full-wafer imprinting and minimized thermal mass
Smart Sample Holder for handling different sizes and irregular shapes
Applications in opto, displays, biotechnologies, data storage, materials, ..., etc
 
NX-1000

NX-1000, Full-Wafer Thermal Nanomprintor

Full-wafer nanoimprinting tool for thermoplastic and thermal curable resists
Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
High throughput due to full-wafer imprinting and minimized thermal mass
Smart Sample Holder for handling different sizes and irregular shapes
Applications in opto, displays, biotechnologies, data storage, materials, ..., etc
 
NX-2000

NX-2000, Full-Wafer Universal Imprintor

Full-wafer (up to 8") nanoimprinting tool
Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
All forms of nanoimprint: photo-curable, thermoplastic & embossing
High throughput due to full-wafer impriting: sub-60 sec/wafer
Optional alignment upgrade available
Smart Sample Holder for handling different sizes and irregular shapes
Applications in opto, displays, biotechnologies, data storage, materials, ..., etc
 
NX-2500

NX-2500, Full-Wafer Imprintor with Alignment

Full-wafer (up to 8") nanoimprinting tool
Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
Sub-micron overlay alignment accuracy
User friendly alignment scheme
Smart Sample Holder for handling different sizes and irregular shapes
Applications in opto, displays, biotechnologies, data storage, materials, ..., etc
 
NX-2600

NX-2600/2600BA, Full-Wafer Imprintor with Alignment and Photolithography

Full-wafer (up to 8") nanoimprinting tool
All forms of nanoimprint and high resolution photolithography
Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
Sub-micron overlay alignment accuracy and optical backside alignment (NX-2600BA)
User friendly alignment scheme
Smart Sample Holder for handling different sizes and irregular shapes
Applications in opto, displays, biotechnologies, data storage, materials, ..., etc
NX-3000

NX-3000, Step-and-Repeat Nanoimprintor With Alignment

Step-and-repeat nanoimprinting tool
Sub-micron alignment accuracy
Enhanced Air Cushion Press (EACP) ensuring uniformity over entire substrate
Photo-curable NIL, upgradable to thermal curable
Integrated resist-drop dispensing system
Sub-70 sec per imprint field
Up to 8" SEMI standard wafers
Applications in semiconductors, micro-wave, opto, displays, bio, data storage, materials,..., etc.

Lumina-200

Lumina-200, Stand-Alone High Resolution Photolithography/Aligner

High Resolution Photolithography
High Precision Alignment Stages
State-of-the-Art Alignment Optics
Precise Gap Control
User Friendly PC Control
Small Footprint
Cost Effective Design
Backside Alignment Available as Option

     
Copyright 2003 Nanonex, Corp. All rights reserved. Last Update 01/2013