Ultra-100:

Integrated Vapor Coater and Cleaner
Description: Nanonex logo contact us Description: waferDescription: Ultra-100, MEMS, NEMS, photomask cleaning, mold cleaning, wafer cleaning, substrate cleaning, sample cleaning, surface treatment, anti-sticking, anti-stiction, hydrophobic, hydrophilic, surface cleaning, UV curing, sample cleaning, descumCopyright 2012 Nanonex Corporation. All rights reserved.

Ultra-100 cleaner/coater offers integrated cleaning and vapor coating with molecular layers for applications which require surface and interface cleaning and surface treatment for wafers and masks/molds (semiconductor applications such as photomasks, MEMS, bio-chips, nano-devices, etc.) and molds/samples (replication, molding, bio-devices, chemical materials, etc.).

Ultra-100 has vacuum, UV O-zone cleaning, molecular vapor coating (molecular layer deposition) capabilities with single or multiple chemical vapors, fully automated process control, and a compact design for desktop operation.

Applications:

•   Photomask cleaning and treatment for anti-sticking and anti-stiction

•   MEMS and NEMS device/wafer cleaning and surface treatment for anti-sticking

•   Bio-medical devices/chips for cleaning and surface treatment for bio-compatibility, hydrophobic, or hydrophilic

•   Micro- and nano- fluidic channels surface treatment

•   Micro-molding, Replicating, Embossing, Imprinting mold or master surface cleaning and surface treatment for anti-sticking (mold releasing)

•   Specifically nanoimprint mold/master cleaning and treatment for anti-sticking

•   Surface cleaning and treatment (surface adhesion promotion treatment) for wafer bonding

•   General semiconductor wafer surface cleaning (resist stripping, resist residual removal, particle/contamination removal, descuming, etc.)

•   UV curing and UV curing in vacuum environment

•   Other general sample cleaning and surface treatments