Nanonex Nanoimprintor Family

Nanonex utilizes patented Air Cushion Press^TM to ensure maximum nanoimprint unformity. The unique Smart Sample Holder design allows the handling of samples of different sizes and irregular shapes. The full-wafer imprinting scheme enables a high processing throughput.

NX-B100/200, Full-Wafer Thermal Nanomprintor

	Full-wafer nanoimprinting tool
	All forms of nanoimprint: photo-curable, thermoplastic & embossing
	Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
	High throughput due to full-wafer imprinting and minimized thermal mass
	Smart Sample Holder for handling different sizes and irregular shapes
	Applications in opto, displays, biotechnologies, data storage, materials, ..., etc

NX-1000, Full-Wafer Thermal Nanomprintor

	Full-wafer nanoimprinting tool for thermoplastic and thermal curable resists
	Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
	High throughput due to full-wafer imprinting and minimized thermal mass
	Smart Sample Holder for handling different sizes and irregular shapes
	Applications in opto, displays, biotechnologies, data storage, materials, ..., etc

NX-2000, Full-Wafer Universal Imprintor

	Full-wafer (up to 12") nanoimprinting tool
	Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
	All forms of nanoimprint: photo-curable, thermoplastic & embossing
	High throughput due to full-wafer impriting: sub-60 sec/wafer
	Optional alignment upgrade available
	Smart Sample Holder for handling different sizes and irregular shapes
	Applications in opto, displays, biotechnologies, data storage, materials, ..., etc

NX-2500, Full-Wafer Imprintor with Alignment

	Full-wafer (up to 8") nanoimprinting tool
	Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
	Sub-micron overlay alignment accuracy
	User friendly alignment scheme
	Smart Sample Holder for handling different sizes and irregular shapes
	Applications in opto, displays, biotechnologies, data storage, materials, ..., etc

NX-2600/2600BA, Full-Wafer Imprintor with Alignment and Photolithography

	Full-wafer (up to 8") nanoimprinting tool
	All forms of nanoimprint and high resolution photolithography
	Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity
	Sub-micron overlay alignment accuracy and optical backside alignment (NX-2600BA)
	User friendly alignment scheme
	Smart Sample Holder for handling different sizes and irregular shapes
	Applications in opto, displays, biotechnologies, data storage, materials, ..., etc

NX-3000, Step-and-Repeat Nanoimprintor With Alignment

	Step-and-repeat nanoimprinting tool
	Sub-micron alignment accuracy
	Enhanced Air Cushion Press (EACP) ensuring uniformity over entire substrate
	Photo-curable NIL, upgradable to thermal curable
	Integrated resist-drop dispensing system
	Sub-70 sec per imprint field
	Up to 8" SEMI standard wafers
	Applications in semiconductors, micro-wave, opto, displays, bio, data storage, materials,..., etc.

Lumina-200, Stand-Alone High Resolution Photolithography/Aligner

	High Resolution Photolithography
	High Precision Alignment Stages
	State-of-the-Art Alignment Optics
	Precise Gap Control
	User Friendly PC Control
	Small Footprint
	Cost Effective Design
	Backside Alignment Available as Option