Nanonex
offers a variety of nanoimprint materials, including resists tailored
for thermoplastic, photo-curable and thermal curable NIL, surface treatment
agents for various purposes, and mold materials. Customized
materials
are also available.
NXR-1000
Series, Thermoplastic and Thermal Curable Resists
Sub-10 nm resolution and wafer-scale uniformity
Ultra-fast
response and excellent flow
Low processing temperature and pressure
Strong adhesion to substrates
Stable at room temperature
Suitable for direct etching and lift-off
NXR-2000
Series, Photo-Curable Resists
Sub-5 nm demonstrated resolution and wafer-scale uniformity
Room temperature operation
Super-low viscosity
Spin-on or resist-drop dispensing
Excellent
etching resistance
Low UV-curing dosage
NXR-3000
Series, Underlayer Resists
Optimizing
direct etching and lift-off processes
Excellent thermal stability
Easy handling and processing
Planarizing sample surfaces
Strong adhesion to top layer resists and substrates
NXR-4000
Series, Mold Materials
Easy mold formation with one-step imprint
Photo-curable
Strong and durable when cured
Stable mechanical and chemical properties
NXT-100
Series, Surfactants for Nanoimprint
Ensuring reliable mold-resist separation
Promoting adhesion between resists and substrates
Easy handling and processing
Stable properties after treatment
Copyright
2003 Nanonex, Corp. All rights reserved.
